F2 157nm准分子激光器镜片/F2 LASER COMPONENT...
- 产地：德国
- 供应商：成都光驰科技有限公司
- 供应商报价：面议
- 标签：F2 157nm准分子激光器镜片/F2 LASER COMPONENTS,-1,成都光驰科技有限公司
产品库
HR (0°, 157nm) R = 92 ... 95% 2 x 10 8 – 1 x 10 9 pulses*
HR (45°, 157nm) R = 90 ... 94% (random pol.)
PR (0°, 157nm) R = 50 ± 3 % 2 x 10 8 – 1 x 10 9 pulses*
PR (0°, 157nm) R = 25 ± 2 % 2 x 10 8 – 1 x 10 9 pulses*
Attenuator T = 67 ± 3 % 5 x 10 7 pulses**, no damage
Attenuator T = 33 ± 3 % 1 x 10 8 pulses***, no damage
Beam splitter T = 20 ± 3 % 1 x 10 8 pulses***, no damage
AR (0°, 157nm) 0.3 ... 0.7 %
Protected Al mirrors (optimized for 157 nm):
R=74 … 78%
• Dielectrically enhanced Al mirrors: up to
R=94% at AOI=0°
• For more information on Al mirrors see pages
122–123
Mirrors and separators for the 160nm range and the 133nm range are produced by coating techniques which were developed for F2 laser coatings.
