TMM60-24B1 日本西格玛光机 变倍式实体显微镜
- 产地:上海
- 供应商:上海求和光电科技有限公司
- 供应商报价: 电议
- 标签:日本西格玛光机 变倍式实体显微镜,日本西格玛光机 变倍式实体显微镜价格,日本西格玛光机 变倍式实体显微镜厂家
| 类型 | 光学显微镜 | 品Pai | 日本西格玛 |
| 型号 | TMM60-24B1 | 仪器放大倍数 | 20X/40X |
| 目镜放大倍数 | WF10X(视野数20) | 物镜放大倍数 | 2X/4X |
| 重量 | 4.3(g) | 适用范围 | 聚焦部分移动范围为47nm |
| 装箱数 | .... |
| High speed lithography without mask by adopting the sub-micron laser spot.Light source : fs laser [second, third and fourth harmonic wave selectable]Stages : non-contact air bearing stage or high speed linear motor stage selectableOptical observation system: coaxial optical unit monitoring for process condition.Auto focus : High speed and fine beam scanning system.Direct laser processing using DXF file, which can be generated by most CAD system.Three-dimensional deep cutting, XY axis’ repeatable processing.High speed scanning processing in visible range size.Applicable range for 6 inches to 300mm wafer.(applicable for longer size) |
| 主要用途 |
| Laser groove-cutting on glass for FPDDirect laser lithography of wire patterningOptical-waveguide fabricationUltra fine oscillation adjustment for crystalLaser drilling on glassFine adjustment for thin film resistorRepairing |