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TMM60-24B1 日本西格玛光机 变倍式实体显微镜

产品信息
类型光学显微镜品Pai日本西格玛
型号TMM60-24B1仪器放大倍数20X/40X
目镜放大倍数WF10X(视野数20)物镜放大倍数2X/4X
重量4.3(g) 适用范围聚焦部分移动范围为47nm
装箱数....
High speed lithography without mask by adopting the sub-micron laser spot.Light source : fs laser [second, third and fourth harmonic wave selectable]Stages : non-contact air bearing stage or high speed linear motor stage selectableOptical observation system: coaxial optical unit monitoring for process condition.Auto focus : High speed and fine beam scanning system.Direct laser processing using DXF file, which can be generated by most CAD system.Three-dimensional deep cutting, XY axis’ repeatable processing.High speed scanning processing in visible range size.Applicable range for 6 inches to 300mm wafer.(applicable for longer size)
主要用途
Laser groove-cutting on glass for FPDDirect laser lithography of wire patterningOptical-waveguide fabricationUltra fine oscillation adjustment for crystalLaser drilling on glassFine adjustment for thin film resistorRepairing

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